Integrated microsystems in standard CMOS technology with applications in the field of chemical sensors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4407, Issue , 2001, Pages 349-358

  Baglio, S ^a   Ando B ^a   Savalli, N ^a  

^a UNIVERSITY OF CATANIA   (Italy)

Author keywords

CMOS microsensors; Material properties characterization; Micro chemical analysis systems

Indexed keywords

CHEMICAL SENSORS; CMOS INTEGRATED CIRCUITS; CRYSTAL STRUCTURE; ETCHING; MICROMACHINING; POLYSILICON;

WET ETCHING PROCESS;

MICROELECTROMECHANICAL DEVICES;

EID: 0034839453     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425320     Document Type: Conference Paper

References (7)

1. A complete methodology for electro-mechanical characterization of a CMOS compatible MEMS technology
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4. Resonant magnetic field microsensors in standard CMOS technology
5. Characterization of parasitic behaviors in CMOS microsensors
6. Development of active PBG structures for realizing novel MOEMS based on transparent metals