Mask cost of ownership for advanced lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 73-83

  Muzio, Ed ^a   Seidel, Phil ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; MASKS; PLANNING; SENSITIVITY ANALYSIS;

COST OF OWNERSHIP; PROCESS FLOW;

LITHOGRAPHY;

EID: 0033666531     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392078     Document Type: Conference Paper

References (3)