Structural relationship of polycrystalline cobalt silicide lines to (001) silicon substrate and their thermal stability

Microelectronic Engineering

Volumn 55, Issue 1-4, 2001, Pages 163-169

  Alberti, A ^a   La Via, F ^b   Spinella, C ^b   Rimini, E ^a  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR IMETEM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DISLOCATIONS (CRYSTALS); EPITAXIAL GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SUBSTRATES; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY;

HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM); SELECTED AREA DIFFRACTION (SAD) ANALYSIS;

COBALT COMPOUNDS;

EID: 0034836762     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00443-3     Document Type: Article

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