Nanosphere lithography: Synthesis and application of nanoparticles with inherently anisotropic structures and surface chemistry

Materials Research Society Symposium - Proceedings

Volumn 635, Issue , 2001, Pages

  Haynes, C L ^a   Haes, A J ^a   Van Duyne, R P ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; DIELECTRIC PROPERTIES; LITHOGRAPHY; PARTICLE SIZE ANALYSIS; RAMAN SCATTERING; REACTIVE ION ETCHING; SURFACE CHEMISTRY; SURFACE PLASMON RESONANCE;

NANOSPHERE LITHOGRAPHY;

NANOSTRUCTURED MATERIALS;

EID: 0034834746     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-635-c6.3     Document Type: Conference Paper

References (12)

1. The image field effect: How important is it?