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Thin Solid Films

Volumn 382, Issue 1-2, 2001, Pages 106-112

Preparation and electrical properties of (Ba,Sr)TiO3 thin films deposited by liquid source misted chemical deposition

(4) Chung, Hyun Jin a Choi, Jae Hyoung a Lee, Jeong Yong a Woo, Seong Ihl a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BARIUM TITANATE; CAPACITORS; CRYSTALLIZATION; FILM GROWTH; LEAKAGE CURRENTS; METALLIC FILMS; PERMITTIVITY; PLATINUM; SILICON WAFERS; SPUTTER DEPOSITION;

BARIUM STRONTIUM TITANATE; FERROELECTRIC THIN FILMS; LIQUID SOURCE MISTED CHEMICAL DEPOSITION (LSMCD);

DIELECTRIC FILMS;

EID: 0034826021 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(00)01771-5 Document Type: Article

Times cited : (20)

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