Liquid metal ion source-produced germanium ions for maskless ion implantation

Journal of Physics D: Applied Physics

Volumn 34, Issue 3, 2001, Pages

  Ganetsos, Th ^a   Aidinis, C ^a   Bischoff, L ^b   Mair, G L R ^a   Teichert, J ^b   Panknin, D ^b   Papadopoulos, I ^a  

^a UNIVERSITY OF ATHENS   (Greece)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE MEASUREMENT; ION BEAMS; ION IMPLANTATION; ION SOURCES; LIQUID METALS; SEMICONDUCTING SILICON COMPOUNDS;

FOCUSED ION BEAMS (FIB); LIQUID METAL ALLOY ION SOURCES (LMAIS); SILICON GERMANIDE;

SEMICONDUCTING GERMANIUM;

EID: 0034825296     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/34/3/102     Document Type: Article

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