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Volumn 60, Issue 3, 2001, Pages 361-368

Reactive filtered arc evaporation

Author keywords

Filtered arc; Optical coatings; Reactive evaporation

Indexed keywords

ADHESION; ALUMINUM; DEPOSITION; ELECTROSTATICS; EVAPORATION; LIGHT REFLECTION; MAGNETIC FIELD EFFECTS; PLASMA APPLICATIONS; REFRACTIVE INDEX; TITANIUM; TITANIUM NITRIDE; VACUUM DEPOSITED COATINGS;

EID: 0034818416     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00425-5     Document Type: Article
Times cited : (17)

References (11)
  • 4
    • 0031988421 scopus 로고    scopus 로고
    • Comparison of unbalanced magnetron sputtering and filtered arc evaporation for the preparation of films onto insulating substrates
    • Mustapha N, Howson RP. Comparison of unbalanced magnetron sputtering and filtered arc evaporation for the preparation of films onto insulating substrates. Vacuum 1998;49(2):75-9.
    • (1998) Vacuum , vol.49 , Issue.2 , pp. 75-79
    • Mustapha, N.1    Howson, R.P.2
  • 7
  • 9
    • 0042523144 scopus 로고
    • A comparison between the performance of an arc evaporation source with ion selection and an unbalanced magnetron sputtering source
    • CEP consultants Ltd. , Brussels
    • Howson RP, Mustapha N, Ja'fer HA, Stenlake ME. A comparison between the performance of an arc evaporation source with ion selection and an unbalanced magnetron sputtering source. Proceedings of the IPAT, CEP consultants Ltd. , Brussels, 1991. p. 328-334.
    • (1991) Proceedings of the IPAT , pp. 328-334
    • Howson, R.P.1    Mustapha, N.2    Ja'fer, H.A.3    Stenlake, M.E.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.