Properties of carbon nitride films deposited with and without electron cyclotron resonance plasma assistance

Thin Solid Films

Volumn 382, Issue 1-2, 2001, Pages 4-12

  Chen, Ming Y ^a   Kramer, Daniel J ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; ELASTIC MODULI; ELECTRON CYCLOTRON RESONANCE; FRICTION; HARDNESS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; SPUTTER DEPOSITION; STAINLESS STEEL; WEAR OF MATERIALS;

CARBON NITRIDE; NANOINDENTATION;

PROTECTIVE COATINGS;

EID: 0034817869     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01779-X     Document Type: Article

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