Sensitizing DNA to secondary electron damage: Resonant formation of oxidative radicals from 5-halouracils [4]

Journal of the American Chemical Society

Volumn 123, Issue 22, 2001, Pages 5354-5355

  Abdoul Carime, H ^a   Huels, M A ^a   Illenberger, E ^a   Sanche, L ^a  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

5 HALOGENOURACIL; DNA; UNCLASSIFIED DRUG; URACIL DERIVATIVE;

CHEMICAL ANALYSIS; DNA DETERMINATION; ELECTRON; ENERGY; LETTER; MODEL; OXIDATION; RADIOSENSITIZATION;

DNA; ELECTRONS; FREE RADICALS; OXIDATION-REDUCTION; URACIL;

EID: 0034806725     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja003952d     Document Type: Letter

References (23)