Electrical linewidth measurement for next generation lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue , 2001, Pages 637-643

  Kye, J ^a   Levinson, H ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

ECD; Electrical CD measurement; Electrical linewidth measurement; ELM

Indexed keywords

ANNEALING; DATA ACQUISITION; DIFFUSION; ELECTRIC VARIABLES MEASUREMENT; GATES (TRANSISTOR); SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SURFACE PROPERTIES;

ELECTRICAL LINEWIDTH MEASUREMENT (ELM);

LITHOGRAPHY;

EID: 0034768322     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436789     Document Type: Conference Paper

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