Laser-induced particle removal from silicon wafers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4065, Issue , 2000, Pages 249-259

  Leiderer, P ^a   Boneberg, J ^a   Dobler, V ^a   Mosbacher, M ^a   Muenzer, H J ^a   Chaoui, N ^a   Siegel, J ^a   Solis, J ^a   Afonso, C N ^a   Fourrier, T ^a   Schrems, G ^a   Baeuerle, D ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CONDENSATION; EVAPORATION; IRRADIATION; LASER DAMAGE; LASER PULSES; NANOTECHNOLOGY; PARTICLE SIZE ANALYSIS; SILICA; SILICON WAFERS; SURFACE CLEANING;

DRY LASER CLEANING; STEAM LASER CLEANING;

LASER APPLICATIONS;

EID: 0033685713     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.407353     Document Type: Conference Paper

References (19)