High-accuracy development monitoring technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3743, Issue , 1999, Pages 142-150

  Ito, Shinichi ^a   Hayasaki, Kei ^a   Kawano, Kenji ^a   Sho, Kotaro ^a   Mimotogi, Shoji ^a   Komatsu, Fumio ^a   Okumura, Katsuya ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; IMAGE ANALYSIS; MASKS; PROCESS CONTROL; SILICON WAFERS;

CHARGE COUPLED DEVICE CAMERA; COLLIMATED ILLUMINATION; HONEYCOMB FORMATION; QUADRILATERAL FORMATION;

LITHOGRAPHY;

EID: 0032661310     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.346907     Document Type: Conference Paper

References (6)