New advances in resist system for next generation lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 881-890

  Hu, Yongqi ^a   He, Wei ^a   Gonsalves, Kenneth E ^b   Merhari, Lhadi ^c  

^a UNIVERSITY OF CONNECTICUT   (United States)

^b UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^c CERAMEC R and D   (France)

Author keywords

Electron beam; Lithography; Nanocomposite; Resist; Sub 100nm resolution

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; MECHANICAL PROPERTIES; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; OPTICAL RESOLVING POWER; ORGANIC POLYMERS; PLASMA ETCHING; SILICA;

MECHANICAL STABILITY; NANOCOMPOSITE RESIST SYSTEMS;

PHOTORESISTS;

EID: 0034758441     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436811     Document Type: Article

References (9)

1. Materials issues and modeling for device nanofabrication