Sub-resolution assist feature and off-axis illumination optimization for 200 and 240 nm contact windows using 248 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 131-139

  Watson, Pat G ^a   Cirelli, Raymond A ^a   Timko, Allen G ^a   Nalamasu, Omkaram ^a   Lockstamphor, Carl ^a   Berger, Steven D ^b   Bassom, Neil J ^b   Sundaram, Ganesh ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b Micrion Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASSIST FEATURES; CONTACT HOLE (CH); ILLUMINATION CONDITIONS; ILLUMINATION OPTIMIZATIONS; QUADRUPOLE; SUB RESOLUTION ASSIST FEATURES (SRAF); SUB-RESOLUTION ASSIST FEATURES;

WINDOWS;

EID: 0002839950     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310743     Document Type: Conference Paper

References (4)

1. J. Garofalo, C. J. Biddick, R. L. Kostelak, and S. Vaidya, J. Vac. Sci. Technol. B 11, 2651 (1993).
2. R. Pforr, A. Wong, K. Ronse, L. Van de hove, A. Yen, S. Palmer, G. Fuller, and O. Otto, "Feature biasing versus feature-assisted lithography - a comparison of proximity correction methods for 0.5*(l/NA) lithography", Optical/Laser Microlithography VIII, T. Brunner, Ed., SPIE vol. 2440, 150-170, 1995.
3. J. F. Chen, T. Laidig, K. E. Wampler, and R, Caldwell, "Practical method for full-chip optical proximity correction", Optical Microlithography X, G. E. Fuller, Ed., SPIE vol. 3051, 790-803, 1997.
4. R. Cirelli, M. Mkrtchyan, G. P. Watson, L. E. Trimble, G. R. Weber, D. L. Windt, and O. Nalamasu, "A new variable transmission illumination technique optimized with design rule criteria", this issue of the proceedings.