Open-contact-failure detection of via holes by using voltage contrast

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue , 2001, Pages 12-21

  Nishiyama, H ^a   Nozoe, M ^a   Aramaki, K ^a   Watanabe, O ^a   Ikeda, Y ^a  

^a HITACHI LTD   (Japan)

Author keywords

Contact resistance; Electron beam; Open contact; Resistance; Scanning electron microscope; Simulation; Voltage contrast; Wafer inspection

Indexed keywords

CORRELATION METHODS; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ELECTRON BEAMS; FAILURE ANALYSIS; SCANNING ELECTRON MICROSCOPY;

VOLTAGE-CONTRAST SIMULATION;

WSI CIRCUITS;

EID: 0034757244     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436736     Document Type: Conference Paper

References (13)