Organic antireflective coatings for 193 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 702-712

  Trefonas, Peter ^a   Blacksmith, Robert ^a   Szmanda, Charles R ^a   Kavanagh, Robert ^a   Adams, Tim ^a   Taylor, Gary N ^a   Coley, Suzanne ^a   Pohlers, Gerd ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMOPHORES; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; STYRENE;

HYDROXY-ALKYL METHACRYLATES;

ANTIREFLECTION COATINGS;

EID: 0032631902     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (5)