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Volumn 62, Issue 23, 2000, Pages 15680-15685

Optimal activation and diffusion paths of perfect events in amorphous silicon

Author keywords

[No Author keywords available]

Indexed keywords

SILICON DIOXIDE;

EID: 0034670855     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.62.15680     Document Type: Article
Times cited : (19)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.