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Physical Review B - Condensed Matter and Materials Physics

Volumn 62, Issue 19, 2000, Pages 13174-13181

Interfacial shear force microscopy

(2) Karrai, Khaled a Tiemann, Ingo a

a UNIVERSITY OF MUNICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON DIOXIDE;

ADSORPTION; ARTICLE; COMPLIANCE (PHYSICAL); CRYSTAL; FORCE; FRICTION; QUANTITATIVE ASSAY; SCANNING ELECTRON MICROSCOPY; SHEAR STRESS; VELOCITY; YOUNG MODULUS;

EID: 0034668613 PISSN: 01631829 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevB.62.13174 Document Type: Article

Times cited : (113)

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