Formation of Ti-Al-N films by an activated reactive evaporation (ARE) method

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 62, Issue 1, 1998, Pages 98-105

  Ide, Yukio ^a   Inada, Kazunori ^a   Nakamura, Takashi ^b   Maeda, Masafumi ^c  

^a Indus Tech Inst Yamaguchi P   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^c INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

Activated reactive evaporation; Hard coating; Mass spectrometry; Optical emission spectroscopy; Oxidation; Titanium aluminum nitride

Indexed keywords

COATINGS; COMPOSITION EFFECTS; EMISSION SPECTROSCOPY; EVAPORATION; IONIZATION OF SOLIDS; MASS SPECTROMETRY; PLASMA APPLICATIONS; SYNTHESIS (CHEMICAL); THERMOOXIDATION; TITANIUM ALLOYS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

ACTIVATED REACTIVE EVAPORATION (ARE); HARD COATINGS;

METALLIC FILMS;

EID: 0031699696     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.62.1_98     Document Type: Article

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