Laser-induced metal-organic chemical vapor deposition (MOCVD) of Cu(hfac)(TMVS) on amorphous Teflon AF1600: An XPS study of the interface

Applied Surface Science

Volumn 126, Issue 3-4, 1998, Pages 198-204

  Popovici, D ^a   Czeremuzkin, G ^a   Meunier, M ^a   Sacher, E ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Amorphous Teflon AF1600; Laser induced metal organic chemical vapor deposition (MOCVD); XPS study

Indexed keywords

ATOMS; BONDING; CARBON; COPPER; EXCIMER LASERS; FLUORINE CONTAINING POLYMERS; INTERFACES (MATERIALS); MONOLAYERS; RADIATION; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

TEFLON AF1600;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0032473789     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00009-9     Document Type: Article

References (16)

1. F.A. Houle, C.R. Jones, T. Baum, C. Pico, C.A. Kovac, Appl. Phys. Lett. 46 (1985) 204.
2. C.R. Moylan, T.H. Baum, C.R. Jones, Appl. Phys. A 40 (1986) 1.
3. Y.S. Liu, C.P. Yukymyshyn, H.R. Philip, H.S. Cole, L.M. Levinson, J. Vac. Sci. Technol. B 3 (1985) 1441.
4. T.F. Deutch, D.J. Ehrlich, R.M. Osgood Jr., Appl. Phys. Lett. 35 (1979) 175.
5. D.J. Ehrlich, J.Y. Tsao, J. Vac. Sci. Technol. B 1 (1983) 969.
6. M. Meunier, P. Desjardins, M. Tabbal, N. Elyaagoubi, R. Izquierdo, A. Yelon, Appl. Surf. Sci. 86 (1995) 475.
7. H.S. Cole, Y.S. Liu, J.W. Rose, R. Guida, Appl. Phys. Lett. 53 (1988) 2111.
8. R. Izquierdo, J. Bertomeu, M. Suys, E. Sacher, M. Meunier, Appl. Surf. Sci. 86 (1995) 509.
9. DuPont Specialty Polymers, Technical Information Bulletins H-16577-1 and H-52454.
10. D. Popovici, E. Sacher, M. Meunier, J. Appl. Polym. Sci., in press.
11. E. Sacher, J.K. Klemberg-Sapieha, J. Vac. Sci. Technol. A 15 (1997) 2143.
12. D. Popovici, J.E. Klemberg-Sapiena, G. Czeremuszkin, E. Sacher, M. Meunier, L. Martinu, Microelectron. Eng. 33 (1997) 217.
13. J.F. Moulder, W.F. Stickle, P.E. Sobol, K.D. Bomben, in: J. Chastain (Ed.), Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer, Eden Prairie, MN, 1992, pp. 87 and 220.
14. R. Ke, R.T. Haasch, N. Finnegan, L.E. Dottl, R.C. Alkire, H.H. Farrell, J. Vac. Sci. Technol. A 19 (1996) 80.
15. J.P. Fackler Jr., F.A. Cotton, D.W. Barnum, Inorg. Chem. 2 (1963) 97.
16. N. Awaya, Y. Arita, Thin Solid Films 262 (1995) 12.