Preparation of quasicrystalline thin films and fine particles by gas evaporation

Materials Science and Engineering A

Volumn 294, Issue 296, 2000, Pages 842-845

  Takeda, Masatoshi ^a   Sakai, Shin ^a   Kawasaki, Akihide ^a   Hattori, Yuji ^a   Katoh, Masashi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EVAPORATION; FILM PREPARATION; LASER ABLATION; PULSED LASER APPLICATIONS; THIN FILMS;

QUASICRYSTALLINE THIN FILMS;

QUASICRYSTALS;

EID: 0034504565     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5093(00)01311-3     Document Type: Article

References (14)

1. K. Kimura, H. Iwahashi, T. Hashimoto, S. Takeuchi, U. Mizutani, S. Ohashi, G. Itoh, J. Phys. Soc. Jpn. 58 (1989) 2472.
2. T. Klein, A. Gozlan, C. Berger, F. Cyrot-Lachmann, Y. Calvayrac, A. Quivy, Europhys. Lett. 13 (1990) 129.
3. B.D. Biggs, S.J. Poon, N.R. Munirathnam, Phys. Rev. Lett. 65 (1990) 2700.
4. S. Takeuchi, H. Iwanaga, T. Shibuya, Jpn. J. Appl. Phys. 30 (1991) 361.
5. J.M. Dubois, P. Plaindoux, E. Belin-Nerre, N. Tamura, D.J. Sordelet, in: Proceedings of the Sixth International Conference on Quasicrystals, Tokyo, Japan, May 26-30, 1997, World Scientific Publishing, Singapore, 1998, p. 733.
6. R. Eisenhammer, A. Trampert, Phys. Rev. Lett. 78 (1997) 262.
7. A. Yoshioka, K. Edagawa, K. Kimura, S. Takeuchi, Jpn. J. Appl. Phys. 34 (1995) 1606.
8. T. Klein, O.G. Symko, Appl. Phys. Lett. 64 (1994) 431.
9. S. Kashu, E. Fuchita, T. Manabe, C. Hayashi, Jpn. J. Appl. Phys. 23 (1984) L910.
10. H. Adachi, Y. Kuroda, T. Imahashi, K. Yanagisawa, Jpn. J. Appl. Phys. 36 (1997) 1159.
11. J. Akedo, M. Ichiki, K. Kikuchi, R. Maeda, Sensors and Actuators A69 (1998) 106.
12. Y. Saito, K. Mihama, H.S. Chen, Phys. Rev. B 35 (1987) 4085.
13. T. Okazaki, T. Maki, Y. Saito, K. Mihama, Jpn. J. Appl. Phys. 28 (1989) 195.
14. O. Eryu, K. Murakami, K. Masuda, A. Kasuya, Y. Mishida, Appl. Phys. Lett. 54 (1989) 2716.