Characterization of TiAlN films deposited by reactive pulsed laser ablation

Thin Solid Films

Volumn 379, Issue 1-2, 2000, Pages 45-49

  Acquaviva, S ^a   D'Anna, E ^a   Elia, L ^a   Fernandez M ^a   Leggieri, G ^a   Luches, A ^a   Martino, M ^a   Mengucci, P ^a   Zocco, A ^a  

^a INFM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; COMPOSITION EFFECTS; LASER ABLATION; PULSED LASER APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE PULSED LASER ABLATION;

PROTECTIVE COATINGS;

EID: 0034497181     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01350-X     Document Type: Article

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