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Surface Review and Letters

Volumn 7, Issue 5-6, 2000, Pages 547-553

Assessment of correlated thermal diffuse scattering as a direct structural method on the multielement surface system of Si(111)(√3 × √3)-In

(3) Abukawa, T a Yoshimura, K a Kono, S a

a TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON;

ACCURACY; CALIBRATION; CHEMICAL STRUCTURE; CONFERENCE PAPER; DIFFUSION; ELECTRON DIFFRACTION; ENERGY; OSCILLATION; SURFACE PROPERTY; TECHNIQUE;

EID: 0034477637 PISSN: 0218625X EISSN: None Source Type: Journal
DOI: 10.1016/S0218-625X(00)00058-0 Document Type: Conference Paper

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.