Photoelectron diffraction study of the surfaces of Si(111)√3×√3-Al and - In with Mo Mζ and Cr Lα lines

Journal of Electron Spectroscopy and Related Phenomena

Volumn 101-103, Issue , 1999, Pages 245-250

  Sumitani, S ^a   Abukawa, T ^a   Kosugi, R ^a   Suzuki, S ^a   Sato, S ^a   Kono, S ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Al; Cr L ; In; Mo M ; Photoelectron diffraction; Si(111) surface; XPD; 3 3 surface

Indexed keywords

EID: 0001704366     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0368-2048(98)00453-8     Document Type: Article

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