Role of oxygen in metal silicide formation and properties

Diffusion and Defect Data Pt.B: Solid State Phenomena

Volumn 71, Issue , 2000, Pages 119-146

  Murarka, S P ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; OXYGEN; REACTION KINETICS; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

SILICIDES;

SEMICONDUCTING FILMS;

EID: 0034463209     PISSN: 10120394     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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