Resolving the non-uniqueness of the activation energy associated with TDDB for SiO2 thin films

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2000, Pages 549-552

  Shanware, A ^a   Khamankar, R B ^a   McPherson, J W ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; PYROLYSIS; SILICA; THERMAL EFFECTS;

ELECTRIC-CURRENT INDUCED DEGRADATION;

THIN FILMS;

EID: 0034454192     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)

1. Complementary model for intrinsic TDDB in SiO2 dielectrics