Non-conventional technologies for micro-optical components: A survey

Proceedings of the International Semiconductor Conference, CAS

Volumn 2, Issue , 2000, Pages 535-538

  Dumbravescu N ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; MICROOPTICS; PHOTOPOLYMERIZATION; SUBSTRATES; X RAYS;

PHOTO RESISTS;

MICROELECTRONICS;

EID: 0034448089     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)

1. MOS Hall elements with three-dimensional microstructure
2. Fabrication technology for wafer through hole interconnections and three-dimensional stacks of chips and wafer
3. Photolithography on micromachined 3D surfaces using electrodeposited photoresists
4. Stress compensated metal stencil masks for selective deposition in microelectronics, micro-mechanics and optoelectronics
5. Replication of diffractive optics
6. From micromechanical elements to device micromachining
7. LiGA and alternative techniques for microoptical components
8. Increasing the resolution of photoelectric rotary encoders
9. Smooth 3-D shaping of thick resists by means of gray-tone lithography
10. High 3-D resolution gray-tone lithography
11. 3-D, high resolution, deep X-ray absorber mask
12. Microoptical components replicated by hot embossing
13. Replication of diffractive gratings using embossing into UV-cured photo-polymers