Smooth 3-D shaping of thick resists by means of gray tone lithography

Proceedings of the International Semiconductor Conference, CAS

Volumn 1, Issue , 1999, Pages 217-220

  Dumbravescu, N ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; INTEGRATED CIRCUIT MANUFACTURE; SCANNING ELECTRON MICROSCOPY;

GRAY TONE LITHOGRAPHY;

PHOTORESISTS;

EID: 0033337888     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (8)