Residual stress analysis in thin membranes obtained by boron diffusion processes

Proceedings of the International Semiconductor Conference, CAS

Volumn 2, Issue , 2000, Pages 471-474

  Manea, E ^a   Cernica, I ^a   Dolocan, V ^a   Muller, R ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; DIFFUSION; DOPING (ADDITIVES); ETCHING; MEMBRANES;

WET ETCHING;

STRESS ANALYSIS;

EID: 0034446344     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)