An improved method for the automated determination of E0 for lithography SPC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 847-858

  Mason, Mark E ^a   Soper, Robert A ^a   Garza, César M ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; REGRESSION ANALYSIS; SEMICONDUCTOR MATERIALS; STATISTICAL PROCESS CONTROL;

RESIST THICKNESS;

LITHOGRAPHY;

EID: 0030316217     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240956     Document Type: Conference Paper

References (3)

1. Photo-chemical investigations and a new method of determination of the sensitiveness of photographic plates
2. Lithographic optimization using photoresist contrast