Characteristics of piezoresistive mass flow sensors fabricated by porous silicon micromachining

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 7134-7137

  Kim, Dong Kwon ^a   Kang, Sung Gyu ^b   Sim, Jun Hwan ^c   Shin, Jang Kyoo ^a   Choi, Pyung ^a   Lee, Jong Hyun ^a  

^a Kyungpook National University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^c Korea Maritime University   (South Korea)

Author keywords

Flow sensor; Micro cantilever; Piezoresistors; Porous silicon micromachining; Wheatstone bridge

Indexed keywords

BRIDGE CIRCUITS; DIFFUSION; MICROMACHINING; PIEZOELECTRIC DEVICES; POROUS SILICON; RESISTORS; SEMICONDUCTING BORON; SILICON WAFERS;

PIEZOELECTRIC MASS FLOW SENSORS; WHEATSTONE BRIDGE;

SENSORS;

EID: 0034428024     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.7134     Document Type: Article

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