Dynamic three-dimensional mask-wafer positioning with nanometer exposure overlay

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 7040-7043

  Moon, Euclid E ^a   Meinhold, Mitchell W ^a   Everett, Patrick N ^b   Smith, Henry I ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Patrick N Everett Consulting   (United States)

Author keywords

Alignment; Lithography; Nanometer; Overlay; X ray

Indexed keywords

LITHOGRAPHY; MICROSCOPIC EXAMINATION; X RAY PRODUCTION;

DYNAMIC THREE-DIMENSIONAL MASK-WAFER POSITIONING; NANOMETERS;

MASKS;

EID: 0034427931     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.7040     Document Type: Article

References (3)

1. E. E. Moon, J. Lee, P. N. Everett and H. I. Smith: J. Vac. Sci. Technol. B 16 (1998) 3631.
2. E. E. Moon, P. N. Everett, M. W. Meinhold, M. K. Mondol and H. I. Smith: J. Vac. Sci. Technol. B 17 (1999) 2698.
3. A. Moel, W. Chu, K. Early, Y.-C. Ku, E. E. Moon, F. Tsai and H. I. Smith: J. Vac. Sci. Technol. B 9 (1991) 3287.