Post-CMP cleaning for metallic contaminant removal by using a remote plasma and UV/Ozone

Journal of the Korean Physical Society

Volumn 37, Issue 6, 2000, Pages 1051-1056

  Lim, Jongmin ^a   Jeon, Bu Yong ^a   Lee, Chongmu ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034347703     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.37.1051     Document Type: Article

References (18)

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