A new post-treatment for chemical-mechanical polishing process of very large-scale integrated circuit tungsten vias

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 7, 1998, Pages 3871-3877

  Park, Heungsoo ^a   Cho, Yong Jun ^a   Song, Jae In ^a   Koh, Young Bum ^a   Lee, Moon Yong ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Chemical mechanical polishing; Contact resistance; Fluoroboric acid; Phosphoric acid; Planarization; Scrubbing; Sheet resistance; Tungsten via

Indexed keywords

ELECTRIC RESISTANCE; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY; VLSI CIRCUITS;

PLANARIZATION; SCRUBBING;

POLISHING;

EID: 0032117927     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.3871     Document Type: Article

References (15)

1. D. Moy, M. Schadt, C. K. Hu, F. B. Kaufman, A. Ray, N. Mazzeo, E. Baran and D. J. Pearson: Proc. 6th Int. Conf. IEEE VLSI Multilevel Interconnect Conference, 1989 (IEEE, Santa Clara, 1989) p. 26.
2. W. J. Patrick, W. L. Guthrie, C. L. Standley and P. M. Schaibe: J. Electrochem. Soc. 138 (1991) 1778.
3. F. B. Kaufman, D. B. Thompson, R. E. Broadie, M. A. Jaso, W. L. Guthrie, D. J. Pearson and M. B. Small: J. Electrochem. Soc. 138 (1991) 3460.
4. W. C. Krusell, J. M. de Larios and J. Zhang: Solid State Technol. 38 (1995) 109.
5. F. Tardif, I. Mansart, T. Lardin, O. Demolliens, M. Fayolle, Y. Gobile, J. Palleau and J. Torres: European Workshop Materials for Advanced Metallization MAM'97 (Soc. Française du Vide, Paris, 1997) p. 74.
6. F. A. Malik: U.S. Patent 5078801 (1992).
7. P. M. Winebarger, M. A. Zaleski, T. B. Morrison and J. J. Sultemeier: U.S. Patent 5478436 (1994).
8. R. E. Blackwell: U.S. Patent 5320706 (1994).
9. S. R. Roy, I. Ali, G. Shinn, N. Furusawa, R. Shah, S. Peterman, K. Witt and S. Eastman: J. Electrochem. Soc. 142 (1995) 216.
10. V. V. Levenets, V. I. Beklemishev, E. P. Kitilenko, I. I. Makhonin, A. Yu. Trifonov, B. A. Loginov and V. V. Protasenko: Jpn. J. Appl. Phys. 34 (1995) 1723.
11. G. E. P. Box and D. W. Behnken: Technometrics 2 (1960) 455.
12. M. Pourbaix: Atlas of Electrochemical Equilibria in Aqueous Solutions (Pergamon Press, Oxford, 1966) 1st ed., Sect. 8.1, p. 216.
13. M. Pourbaix: Atlas of Electrochemical Equilibria in Aqueous Solutions (Pergamon Press, Oxford, 1966) 1st ed., Sect. 10.3, p. 282.
14. D. C. Montgomery: Introduction to Statistical Process Control (John Wiley & Sons, New York, 1991) 2nd ed., Chap. II, p. 120.
15. M. Heyns, C. Hasenack, R. de Keersmaecher and R. Falster: Microelectron. Eng. 10 (1991) 235.