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Applied Physics A: Materials Science and Processing

Volumn 71, Issue 5, 2000, Pages 583-586

Artificially nanostructured Cu:Al2O3 films produced by pulsed laser deposition

(7) Serna, R a Afonso, C N a Ricolleau, C b Wang, Y b Zheng, Y b Gandais, M b Vickridge, I c

a INSTITUTO DE ÓPTICA (Spain)

b UNIVERSITÉ PIERRE ET MARIE CURIE (France)

c INSTITUT DES NANOSCIENCES DE PARIS (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; INTERFACES (MATERIALS); NANOSTRUCTURED MATERIALS; NUCLEATION; PULSED LASER APPLICATIONS; SILICON; VACUUM APPLICATIONS;

NANOCRYSTALS; PULSED LASER DEPOSITION;

AMORPHOUS FILMS;

EID: 0034324752 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390000619 Document Type: Article

Times cited : (26)

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