Use of spin-coated TXRF reference samples for ToF-SIMS metal contaminant quantification on silicon wafers

Surface and Interface Analysis

Volumn 29, Issue 11, 2000, Pages 798-803

  Lazzeri, Paolo ^a   Lui, Alberto ^a   Moro, Lorenza ^b   Vanzetti, Lia ^a  

^a ITC IRST   (Italy)

^b SRI INTERNATIONAL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; EMISSION SPECTROSCOPY; FLUORESCENCE; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

SPIN COATING; TOTAL REFLECTION X RAY FLUORESCENCE SPECTROSCOPY (TXRF);

SILICON WAFERS;

EID: 0034323030     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/1096-9918(200011)29:11<798::AID-SIA934>3.0.CO;2-X     Document Type: Article

References (11)

1. Graft K. Metal Impurities in Silicon-Device Fabrication. Springer-Verlag: Berlin, 1995.
2. The National Technology Roadmap for Semiconductors. 1998 update, http://public.itrs.net/files/1998 update/98 update.htm, Table 1, Table 61.
3. Eichinger P, Rath HJ, Schwenke H. In Semiconductor Fabrication: Technology and Metrology, Gupta DC (ed). American Society for Testing and Materials ASTM STP 990, 1988; 305.
4. Shiraiwa T, Fujino N, Sumita S, Tanizoe T. In Semiconductor Fabrication: Technology and Metrology, Gupta DC (ed). American Society for Testing and Materials ASTM STP 990, 1988; 314.
5. Neumann C, Eichinger P. Spectrochim. Acta 1991; 46B: 1369.
6. Chu PK, Shueler BW, Reich F, Lindley PM. J. Vac. Sci. Technol. 1997; B15: 1908.
7. Hourai M, Naridomi T, Oka Y, Murakami K, Sumira S, Fujino F, Shiraiwa T. Jpn. J, Appl. Phys. 1988; 27: L2361.
8. Schnieders A, Möllers R, Terhorst M, Kramer HG, Niehuis E, Benninghoven A. J. Vac. Sci, Technol. 1996; B14: 2712.
9. Briggs D, Riviére JC. In Practical Surface Analysis, vol. 1, Briggs D, Seah MP (eds). John Wiley: Chichester, 1990.
10. Diebold AC, Maillot P, Gordon M, Baylis J, Chacon J, Witowsky R. J. Vac. Sci. Technol. 1992; A10: 2945.
11. Klochenkaemper R, Knoth J, Prange A, Schwenke H. Anal. Chem. 1992; 64: 1115A.