Determination of trace metallic impurities on 200-mm silicon wafers by time-of-flight secondary-ion-mass spectroscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 1908-1912

  Chu, Paul K ^a   Schueler, Bruno W ^b   Reich, Fraser ^b   Lindley, Patricia M ^c  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b Physical Electronics   (United States)

^c CHARLES EVANS AND ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010073817     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589577     Document Type: Article

References (9)

1. R. S. Hockett and P. K. Chu, ICMPC Proceedings, edited by X. F. Zong, Y. Y. Wang, and X. Y. Gu, Shanghai, 21-25 Oct. 1991, p. 563.
2. R. S. Hockett and P. K. Chu, ICSICT'92 Proceedings, Beijing, 1992 (unpublished), p. 262.
3. P. K. Chu and R. S. Hockett, Semicond. Int. 6, 142 (1994).
4. P. K. Chu, Mater. Chem. Phys. 38, 203 (1994).
5. P. K. Chu, R. W. Odom, and D. F. Reich, Mater. Chem. Phys. 43, 87 (1996).
6. B. W. Schueler, Microcontamination Conference, 1993 (unpublished).
7. B. W. Schueler, Microsc. Microanal. Microstruct. 3, 119 (1992).
8. P. K. Chu, S. P. Smith, and R. J. Bleiler, J. Vac. Sci. Technol. B 14, 3321 (1996).
9. Annual Book of ASTM Standards Designation F1617-95, 1995, p. 1.