Numerical and experimental investigation of the influence of mass transfer on HF/H2O vapor-phase etching of silicon dioxide

Journal of the Electrochemical Society

Volumn 147, Issue 11, 2000, Pages 4142-4147

  Zhou, Jie ^a   Wolden, Colin A ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; EQUATIONS OF STATE OF GASES; ETCHING; NUMERICAL ANALYSIS; REACTION KINETICS; SILICA; SUBSTRATES; SURFACE CHEMISTRY; TRANSPORT PROPERTIES;

MASS TRANSFER COEFFICIENT; STAGNATION FLOW; VAPOR PHASE ETCHING;

MASS TRANSFER;

EID: 0034322215     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1394032     Document Type: Article

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