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Volumn 71, Issue 5, 2000, Pages 593-596

Nonlinear thickness dependence of two-photon absorptance in Al2O3 films

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ARGON; CALORIMETRY; LASER APPLICATIONS; LIGHT ABSORPTION; PHOTONS;

EID: 0034320867     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390000588     Document Type: Article
Times cited : (17)

References (11)
  • 6
    • 0038464486 scopus 로고    scopus 로고
    • ed. by L. Van den Hove. Proc. SPIE
    • E. Eva, K. Mann: In Optical Microlithograpy XI, ed. by L. Van den Hove. Proc. SPIE 3334, 1055 (1998)
    • (1998) Optical Microlithograpy XI , vol.3334 , pp. 1055
    • Eva, E.1    Mann, K.2
  • 7
    • 85037796138 scopus 로고    scopus 로고
    • ISO 11551: TC 172/SC 9/ WG 6. International Organisation of Standardization, Geneva
    • ISO 11551: TC 172/SC 9/ WG 6. International Organisation of Standardization, Geneva (1997)
    • (1997)
  • 9
    • 0032679794 scopus 로고    scopus 로고
    • Laser-induced Damage in Optical Materials: 1998
    • ed. by H.E. Bennett, A.H. Guenther, M.R. Kozlowski, B.E. Newnam, M.J. Soileau
    • J. Heber, R. Thielsch, H. Blaschke, N. Kaiser, U. Leinhos, A. Görtler: In Laser-Induced Damage in Optical Materials: 1998, ed. by H.E. Bennett, A.H. Guenther, M.R. Kozlowski, B.E. Newnam, M.J. Soileau, Proc. SPIE 3578, 83 (1999)
    • (1999) Proc. SPIE , vol.3578 , pp. 83
    • Heber, J.1    Thielsch, R.2    Blaschke, H.3    Kaiser, N.4    Leinhos, U.5    Görtler, A.6
  • 10
    • 0005189842 scopus 로고    scopus 로고
    • Laser-induced damage in optical materials: 1996
    • ed. by H.E. Bennett, A.H. Guenther, M.R. Kozlowski, B.E. Newnam, M.J. Soileau
    • E. Eva, K. Mann: In Laser-Induced Damage in Optical Materials: 1996, ed. by H.E. Bennett, A.H. Guenther, M.R. Kozlowski, B.E. Newnam, M.J. Soileau Proc. SPIE 2966, 48 (1997)
    • (1997) Proc. SPIE , vol.2966 , pp. 48
    • Eva, E.1    Mann, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.