Progress on nanostructuring with nanojet

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3525-3529

  Voigt, J ^a   Shi, F ^a,c   Hudek, P ^a,d   Rangelow, I W ^a   Edinger, K ^b  

^a UNIVERSITY OF KASSEL   (Germany)

^b UNIVERSITY OF MARYLAND   (United States)

^c INFINEON TECHNOLOGIES AG   (Germany)

^d Vistec Electron Beam GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

JETS; NOZZLES; PLASMA APPLICATIONS; SEMICONDUCTING SILICON;

NANOJET TECHNOLOGY;

NANOTECHNOLOGY;

EID: 0034318194     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319823     Document Type: Article

References (2)

1. J. Voigt et al., J. Vac. Sci. Technol. B 17, 2764 (1999).
2. T. Gotszalk et al., Ultramicroscopy 82, 39 (2000).