Characterization of field stitching in electron-beam lithography using moire metrology

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3287-3291

  Murphy, T E ^a   Mondol, Mark K ^a   Smith, Henry I ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MEASUREMENT ERRORS; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY;

INTERFIELD STITCHING ERRORS; MOIRE PRINCIPLES; VERNIER METHODS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034318139     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1313573     Document Type: Article

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