Sub-nanometer metrology of chirped phase masks by optical Moire

Optics Communications

Volumn 170, Issue 4, 1999, Pages 175-179

  Barnier, F ^a   Dyer, P E ^a   Snelling, H V ^a   De La Rue, R M ^b  

^a UNIVERSITY OF HULL   (United Kingdom)

^b UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC FIELD MEASUREMENT; ELECTROMAGNETIC WAVE DIFFRACTION;

CHIRPED PHASE MASKS; OPTICAL MOIRE;

LIGHT PROPAGATION;

EID: 0033349156     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(99)00461-7     Document Type: Article

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