Assessment of phase mask stitch errors by the Moire technique

Optics Communications

Volumn 162, Issue 4, 1999, Pages 299-305

  Barnier, F ^a   Dyer, P E ^a   Steigmann, G A ^a  

^a UNIVERSITY OF HULL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; MASKS;

MOIRE TECHNIQUES; PHASE MASKS; STITCH ERRORS;

OPTICAL FIBER FABRICATION;

EID: 0032671150     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(99)00126-1     Document Type: Article

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