Mechanical analysis of the PLASMAX particle removal process for optical and next-generation lithography masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3221-3226

  Semke, W H ^a,c   Weisbrod, E J ^a   Engelstad, R L ^a   Lovell, E G ^a   Festa, J J ^b   Bailey, J B ^b  

^a University of Wisconsin Madison   (United States)

^b Beta Squared Inc   (United States)

^c University of North Dakota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; INTEGRATED CIRCUIT MANUFACTURE; MEMBRANES; OPTIMIZATION; SILICA; SURFACE CHEMISTRY;

NEXT-GENERATION LITHOGRAPHY MASKS;

LITHOGRAPHY;

EID: 0034317538     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1314369     Document Type: Article

References (10)

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