Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographies

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3578-3581

  Puscasu, Irina ^a   Boreman, G ^a   Tiberio, R C ^b   Spencer, D ^b   Krchnavek, R R ^c  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b Department of Theoretical and Applied Mechanics and the Cornell Nanofabrication Facility   (United States)

^c ROWAN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FABRICATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MASKS; NANOTECHNOLOGY; NATURAL FREQUENCIES; RESONANT CIRCUITS;

FREQUENCY SELECTIVE SURFACES (FSS); NANOIMPRINT LITHOGRAPHY (NIL);

ELECTRON BEAM LITHOGRAPHY;

EID: 0034316496     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319838     Document Type: Article

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