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Volumn 18, Issue 6, 2000, Pages 3535-3538

Oxide nanodots and ultrathin layers fabricated on silicon using nonfocused multicharged ion beams

a X ion (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CRYSTALLINE MATERIALS; ETCHING; ION BEAMS; NANOTECHNOLOGY; OXYGEN; PARTIAL PRESSURE; SUBSTRATES; ULTRATHIN FILMS; VACUUM;

OXIDE NANODOTS;

SEMICONDUCTING SILICON;

EID: 0034316493 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1324647 Document Type: Article

Times cited : (21)

References (7)

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