Image acceleration of highly charged ions on metal, semiconductor, and insulator surfaces

Physical Review A - Atomic, Molecular, and Optical Physics

Volumn 55, Issue 4, 1997, Pages R2523-R2526

  Briand, J P ^a   Thuriez, S ^a   Giardino, G ^a   Borsoni, G ^a   Le Roux, V ^a   Froment, M ^a   Eddrief, M ^a   de Villeneuve, C ^a   D'Etat Ban, B ^a   Sebenne C ^a  

^a SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ARGON; ELECTROMAGNETIC WAVE BACKSCATTERING; ELECTRONS; GOLD; KINEMATICS; SILICA; SURFACES; X RAY SPECTROSCOPY;

GRAZING INCIDENCE; IMAGE ACCELERATION; IONIC BACKSCATTERING; KINETIC ENERGY;

IONS;

EID: 0031125293     PISSN: 10502947     EISSN: 10941622     Source Type: Journal    
DOI: 10.1103/PhysRevA.55.R2523     Document Type: Article

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