Optimization of microcolumn electron optics for high-current applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3057-3060

  Mankos, M ^a   Lee, K Y ^a   Muray, L ^a   Spallas, J ^a   Hsu, Y ^a   Stebler, C ^a   DeVore, W ^a   Bullock, E ^a   Chang, T H P ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; MICROOPTICS; OPTICAL INSTRUMENT LENSES; OPTICAL SYSTEMS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY;

MICROCOLUMN ARRAYS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034316077     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321756     Document Type: Article

References (6)

1. M. A. McCord, J. Vac. Sci. Technol. B 15, 2125 (1997).
2. H. C. Pfeiffer et al., J. Vac. Sci. Technol. B 11, 2332 (1993).
3. Y. Nakayama, S. Okazaki, N. Saitou, and H. Wakabayashi, J. Vac. Sci. Technol. B 8, 1836 (1990).
4. T. H. P. Chang et al., J. Vac. Sci. Technol. B 14, 3774 (1996).
5. E. Kratschmer et al., J. Vac. Sci. Technol. B 13, 2498 (1995).
6. M. G. R. Thomson and T. H. P. Chang, J. Vac. Sci. Technol. B 13, 2445 (1995).