Nanostructures and defects in silicon-hydrogen alloys prepared by argon dilution

Journal of Non-Crystalline Solids

Volumn 276, Issue 1, 2000, Pages 46-55

  Das, U K ^a   Middya, A R ^a   Rath, J K ^a   Longeaud, C ^b   Williamson, D L ^c   Chaudhuri, P ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

^b UNIV PARIS SUD   (France)

^c Department of Geology and Geological Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ARGON; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; HYDROGEN; NANOSTRUCTURED MATERIALS; PHOTOCONDUCTIVITY; PHOTOCURRENTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; X RAY ANALYSIS; X RAY SCATTERING;

DUAL BEAM PHOTOCONDUCTIVITY; MODULATED PHOTOCURRENT (MPC) METHOD; PHOTOTHERMAL DEFLECTION SPECTROSCOPY (PDS); SMALL-ANGLE X RAY SCATTERING (SAXS);

AMORPHOUS FILMS;

EID: 0034301408     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(00)00279-9     Document Type: Article

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