Towards a multiscale approach to the growth of silicon films by chemical vapor deposition

Materials Chemistry and Physics

Volumn 66, Issue 2, 2000, Pages 229-235

  Masi, Maurizio ^a   Bertani, Valeria ^a   Cavallotti, Carlo ^a   Carrà, Sergio ^a  

^a POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; MASS TRANSPORTATION; MICROELECTRONICS; MORPHOLOGY; PHASE TRANSITIONS; SURFACES;

POLYCRYSTALLINE SILICON GROWTH;

SEMICONDUCTING SILICON;

EID: 0034300788     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(00)00323-0     Document Type: Article

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